Likewise, process parameters and properties of copper films deposited from precursors working with critical ligand programs for instance aminoalkoxides, amidinates, guanidinates, betadiketonates and betaketoiminates are introduced. Surface chemistry is examined from your point of view from the similarities of CVD and ALD, taking into consideration precursors that could be used https://ald-surface-engineering37581.look4blog.com/58555024/detailed-notes-on-ald-nanotechnology